发明名称 |
METHOD AND DEVICE FOR VACUUM-COATING A SUBSTRATE |
摘要 |
A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed. |
申请公布号 |
EP0990061(A1) |
申请公布日期 |
2000.04.05 |
申请号 |
EP19980936157 |
申请日期 |
1998.06.15 |
申请人 |
ROBERT BOSCH GMBH |
发明人 |
BURGER, KURT;WEBER, THOMAS;VOIGT, JOHANNES;LUCAS, SUSANNE |
分类号 |
B23B27/14;C23C8/36;C23C14/06;C23C14/22;C23C16/27;C23C16/30;C23C16/50;C23C16/503;C23C28/04;H01J37/32;(IPC1-7):C23C16/50;C23C16/42;C23C16/34;C23C16/32;C23C16/26;C23C16/24;C23C16/36;C23C28/00 |
主分类号 |
B23B27/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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