发明名称 PLASMA REACTOR FOR REMOVAL OF CONTAMINANT
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma reactor for removal of contaminants, which is located between a process chamber and a vacuum pump and generates low pressure plasma to remove contaminants emitted from a process chamber. <P>SOLUTION: The plasma reactor 310 includes: at least one dielectric body 30 that forms a plasma generation space therein; ground electrodes 41, 42 connected to at least one end of the dielectric body 30; and at least one driving electrode 50 fixed to an outer peripheral surface of the dielectric body 30, and connected to an AC power supply unit 60 to receive an AC driving voltage. Each of the ground electrodes 41, 42 has a non-uniform diameter along the lengthwise direction of the plasma reactor 310. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013084561(A) 申请公布日期 2013.05.09
申请号 JP20120147025 申请日期 2012.06.29
申请人 KOREA INST OF MACHINERY & MATERIALS 发明人 KYO MIN;LEE JAE-OK;JIANG YU SHI;LEE DAE HOON;KIM KWAN-TAE;SONG YOUNG-HOON
分类号 H05H1/46;B01D53/68;B01J19/08;C23C16/44;H01L21/3065;H01L21/31 主分类号 H05H1/46
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