发明名称 SUBSTRATE TRANSFER APPARATUS FOR SUBSTRATE PROCESSING SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To eliminate the need for cable routing process in a transfer chamber at a substrate transfer apparatus of a processing system for processing a substrate. <P>SOLUTION: A substrate transfer apparatus includes: a chamber wall 12; a table 14; a linear motor transfer mechanism 16; an optical window 18; and a laser measurement device. The chamber wall defines a transfer space S. The table is housed in the transfer space. A substrate may be placed on the table. The linear motor transfer mechanism transfers the table in the transfer space using the linear motor. The optical window is provided between the transfer space and an exterior space of the transfer space. For example, the optical window is provided so as to seal an opening defined on the chamber wall. The laser measurement device radiates laser light to the table through the optical window, receives reflection light from the table, and measures the position of the table. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013084849(A) 申请公布日期 2013.05.09
申请号 JP20110224996 申请日期 2011.10.12
申请人 TOKYO ELECTRON LTD 发明人 HIROKI TSUTOMU
分类号 H01L21/677;B65G49/07 主分类号 H01L21/677
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