发明名称 ABLATION PROCESSING METHOD OF CERAMIC SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide an ablation processing method of a ceramic substrate, whereby energy diffusion and reflection of a laser beam can be suppressed. <P>SOLUTION: The ablation processing method of a ceramic substrate involves performing an ablation processing by irradiating the ceramic substrate with a laser beam. The method comprises: a protection film formation step of applying a liquid resin onto at least a target area of the ceramic substrate for the ablation processing, wherein the liquid resin has a fine powder of a nitride capable of absorbing the wavelength of the laser beam mixed therein, thereby forming a protection film containing the fine powder; and a laser processing step of, after carrying out the protection film formation step, irradiating the area of the ceramic substrate on which the protection film is formed with the laser beam, thereby performing the ablation processing. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013082564(A) 申请公布日期 2013.05.09
申请号 JP20110221710 申请日期 2011.10.06
申请人 DISCO CORP 发明人 KITAHARA NOBUYASU
分类号 C04B41/91;B23K26/00;B23K26/18;B23K26/36;H01G13/00 主分类号 C04B41/91
代理机构 代理人
主权项
地址