发明名称 ABLATION PROCESSING METHOD FOR GLASS SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide an ablation processing method for a glass substrate that can suppress diffusion of energy and reflection of a laser beam. <P>SOLUTION: There is provided the ablation processing method for the glass substrate that carries out ablation processing by irradiating the glass substrate with a laser beam, the ablation processing method including a protective film forming step of forming a fine powder-mixed protective film by applying a liquid resin with which fine particles of a nitride having absorptivity to the wavelength of the laser beam to at least an area of the substrate to be subjected to the ablation processing; and a laser processing step of carrying out the ablation processing by irradiating the area of the glass substrate in which the protective film is formed with the laser beam after the protective film forming step. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013082565(A) 申请公布日期 2013.05.09
申请号 JP20110221713 申请日期 2011.10.06
申请人 DISCO CORP 发明人 KITAHARA NOBUYASU
分类号 C03B33/09;B23K26/00;B23K26/18;B23K26/36;B28D5/00;H01L21/301 主分类号 C03B33/09
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