发明名称 Dispersions of submicron doped silicon particles
摘要 Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
申请公布号 US8435477(B2) 申请公布日期 2013.05.07
申请号 US201113240785 申请日期 2011.09.22
申请人 KAMBE NOBUYUKI;CHIRUVOLU SHIVKUMAR;NANOGRAM CORPORATION 发明人 KAMBE NOBUYUKI;CHIRUVOLU SHIVKUMAR
分类号 C01B33/02 主分类号 C01B33/02
代理机构 代理人
主权项
地址