发明名称 AMORPHOUS SEMICONDUCTOR THIN FILM TRANSISTOR WITH AN ACTIVE LAYER DOPED WITH DIFFERENTIAL CONCENTRATIONS AND ITS MANUFACTURING METHOD
摘要 <p>PURPOSE: An amorphous semiconductor thin film transistor with an active layer doped with different concentrations and a manufacturing method thereof are provided to improve stability by making the doping concentration of a semiconductor layer different. CONSTITUTION: A gate is formed on a substrate. A gate insulating layer is formed on the gate. Semiconductor layers doped with different concentrations are laminated to form an active layer(140). A source(150) is in contact with the active layer. A drain(160) is in contact with the active layer.</p>
申请公布号 KR20130046317(A) 申请公布日期 2013.05.07
申请号 KR20110110835 申请日期 2011.10.27
申请人 KOOKMIN UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION 发明人 KIM, DEA HWAN;KIM, DONG MYONG;KIM, JAE HYEONG;JEONG, HYUN KWANG
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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