| 摘要 |
PURPOSE: A lithography apparatus is provided to quickly transfer substrate and to improve throughput of the lithography apparatus. CONSTITUTION: A lithography apparatus comprises a substrate table(WT) for maintaining a substrate(W); a compartment(WSC) for accommodating the substrate table; a thermal conditioning unit(TCU) for accommodating the substrate to be exposed, and arranging the substrate to be heat treated; and a transfer system for transferring the heat treated substrate to the substrate table. During transferring the heat treated substrate, the substrate table and the thermal conditioning unit are arranged in the compartment.
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