| 摘要 |
PURPOSE: A method for fabricating a knitted fabric of low lint using nylon/polyester partition yarn is provided to minimize lint and to prevent scratch in case of wiping a wafer and optical lens. CONSTITUTION: A knitted fabric using nylon/polyester partition yarn is fabricated by spraying air to draw texture yarn(DTY) to remove lint and dust in case of knitting with DTY, partitioning with 1-10% of sodium hydroxide(NaOH) solution at 80-110°C for 25-50 minutes, and shrinking the knitted fabric. The fineness of the DTY is 40-90 denier. |
