| 发明名称 |
Photo-patternable dielectric materials and formulations and methods of use |
| 摘要 |
Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.
|
| 申请公布号 |
US8431670(B2) |
申请公布日期 |
2013.04.30 |
| 申请号 |
US20090550683 |
申请日期 |
2009.08.31 |
| 申请人 |
ALLEN ROBERT DAVID;BROCK PHILLIP JOE;DAVIS BLAKE W.;LIN QINGHUANG;MILLER ROBERT DENNIS;NELSON ALSHAKIM;SOORIYAKUMARAN RATNAM;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ALLEN ROBERT DAVID;BROCK PHILLIP JOE;DAVIS BLAKE W.;LIN QINGHUANG;MILLER ROBERT DENNIS;NELSON ALSHAKIM;SOORIYAKUMARAN RATNAM |
| 分类号 |
C08G77/20 |
主分类号 |
C08G77/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
