发明名称 METHOD OF PREPARING GOLD NANOSTRUCTURE USING THE ELECTRODLESS DISPLACEMENT PLATING METHOD
摘要 <p>PURPOSE: A manufacturing method for gold nanostructure using an electroless displacement plating method are provided to uniformly manufacture gold nanostructure on a large area, to manufacture without other mediators, and to facilitate to manufacture gold nanostructure without applying electric energy. CONSTITUTION: A manufacturing method for gold nanostructure using an electroless displacement plating method comprises the following steps: forming a metal layer by evaporating a metal with lower reduction potential than gold to a substrate; and reacting a plating solution which contains gold ions with the metal layer. The metal with lower reduction potential than gold indicates Ni, Pt, Ag, or Cu. The gold nanostructure is a nanoflower or nanolawns structure. [Reference numerals] (AA) Plating solution; (BB) Reaction in the solution; (CC) Seed metal ion; (DD) Au ion; (EE) Metal; (FF) Substrate; (GG) Metal nanostructure;</p>
申请公布号 KR20130042341(A) 申请公布日期 2013.04.26
申请号 KR20110106589 申请日期 2011.10.18
申请人 KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 KIM, SANG KYUNG;PARK, SANG HWI
分类号 C23C18/42;B82B3/00 主分类号 C23C18/42
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