发明名称 A FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD.
摘要 <p>A fluid handling structure for a lithographic apparatus, the fluid handling structure to confine liquid to a space, the fluid handling structure having, on an undersurface surrounding the space, a liquid supply opening to supply liquid onto an undersurface of the fluid handling structure and, radially inward with respect to the space of the liquid supply opening, a two dimensional array of liquid extraction openings to extract a liquid from the space and to extract liquid on the undersurface from the liquid supply opening.</p>
申请公布号 NL2009472(A) 申请公布日期 2013.04.25
申请号 NL20122009472 申请日期 2012.09.17
申请人 ASML NETHERLANDS B.V. 发明人 RIEPEN MICHEL
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址