| 摘要 |
<P>PROBLEM TO BE SOLVED: To expose a prescribed position on a film with high accuracy without changing a mask even when the film which is exposure subject is deformed or biased in the width direction due to such as heat expansion, heat shrinkage and meandering of the film. <P>SOLUTION: Exposure light emitted from light sources 5A, 5B to a film 1 which is exposure subject are respectively transmitted and radiated through an aperture 3A or masks 2A, 2B. A plurality of slits 2b inclining in the direction of the movement of the film are provided in a mask 2 and the width and the spacing of the slits are linearly varied along the moving direction of the film. An aperture 3 has an opening 3b extending in the direction orthogonal to the moving direction of the film and a control apparatus moves the mask 2 in the moving direction of the film relatively to the aperture 3 on the basis of the positions of a substrate alignment mark 1a and a mask alignment mark 2e detected by a camera 7. <P>COPYRIGHT: (C)2013,JPO&INPIT |
