发明名称 LIGHT IRRADIATION DEVICE, SUBSTRATE PROCESSING DEVICE, AND CONTROL METHOD FOR LIGHT IRRADIATION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a light irradiation device, a substrate processing device and a control method for the light irradiation device, capable of suppressing decrease in substrate processing efficiency while achieving lower power consumption. <P>SOLUTION: As edge exposure processing, an edge exposure unit processes exposure of the peripheral edge portion of a substrate. The edge exposure unit includes an exposure light source of light for exposure, to expose the peripheral edge portion of the substrate. To the exposure light source, power is supplied from a lamp driver. The lamp driver is controlled by a controller. The controller sets a normal mode in an edge exposure processing period for processing edge exposure of the substrate. In the normal mode, first power PW1 is supplied to the exposure light source. The controller sets a power saving mode in a non-processing period excluding the edge exposure processing period. In the power saving mode, second power PW2 smaller than the first power PW1 is supplied to the exposure light source. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013077641(A) 申请公布日期 2013.04.25
申请号 JP20110215460 申请日期 2011.09.29
申请人 SOKUDO CO LTD 发明人 ONO KAZUYA;KUBO YASUNORI;INAGAKI YUKIHIKO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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