| 摘要 |
<p>PURPOSE: A liquid processing device, a liquid processing method, and a computer readable storage medium are provided to reduce substrate processing time by supplying processing solutions to a substrate while the substrate is horizontally maintained. CONSTITUTION: A substrate maintaining unit(21) maintains a substrate(W) in a processing space. A first nozzle(31A) supplies a first processing solution to the substrate maintained by the substrate maintaining unit. A second nozzle(31B) supplies a second processing solution to the substrate maintained by the substrate maintaining unit. An exhaust device switches a first discharge path and a second discharge path. An air hood(70) covers the upper side of the substrate maintained by the substrate maintaining unit. A control unit controls the substrate maintaining unit, the first nozzle, the second nozzle, and the discharge device.</p> |
