| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve the problem that a sufficient molding aperture contrast of SEM image is not obtained when observing an opening pattern of a molding aperture using a scanning electron microscope. <P>SOLUTION: An absorption layer 15 which suppresses releasing of secondary electrons 14 is provided at a position, being on a surface of a tool 9 and directly under an opening pattern 1 when a molding aperture 8 is mounted. As the absorption layer 15, a material of low releasing efficiency of the secondary electrons 14 is appropriately selected. As a result, it becomes difficult to detect the secondary electron 14 from an edge region 11 of the opening pattern 1, thereby an intrinsic contrast of SEM image can be obtained. Since in a conventional tool, a surface of a tool 9 directly under the opening pattern 1 of the molding aperture 8 is exposed, primary electrons 13 that have passed the opening pattern 1 are radiated to the surface of the tool 9, thereby releasing the secondary electrons 14 in no small amount. As a result, the secondary electrons 14 are detected on the edge region 11 of the opening pattern 1, which are not detected in a normal situation, thereby degrading contrast of the SEM image. <P>COPYRIGHT: (C)2013,JPO&INPIT |
