| 摘要 |
Provided is a heat treatment apparatus for an annealing process which can reduce variations in temperature within a coil. The heat treatment apparatus for an annealing process includes: a base plate (100) on which a coil (400) is arranged; a cover (200), the lower side of which is open, to surround the coil (400), wherein the open lower portion (210) thereof is sealed on the edge of the base plate (100); and a support unit (300) supporting the lower portion of the base plate (100) such that a heat transfer space part (520), in which radiant heat is transferred by an external heat source, is defined in the lower portion of the base plate (100). |
