发明名称 |
METHOD TO MANUFACTURE PROCESSED SURFACE AND VACUUM SOURCES OF PLASMA |
摘要 |
FIELD: electricity.SUBSTANCE: when processing surfaces of substrates or processed parts with the help of a vacuum plasma discharge between an anode (9) and a cathode (7) a solid substance (19) is formed and deposited on an anode surface (21), and this substance has a higher specific impedance by DC compared to the specific DC impedance of the anode material. At least parts of the anode surface are screened against such deposition by establishment of a screening plasma (25) onto them. There are also versions of vacuum sources of plasma disclosed, which implement the proposed method.EFFECT: expansion of plasma source functional capabilities.36 cl, 16 dwg |
申请公布号 |
RU2479885(C2) |
申请公布日期 |
2013.04.20 |
申请号 |
RU20100122060 |
申请日期 |
2007.11.01 |
申请人 |
EHRLIKON TREJDING AG, TRJUBBAKH |
发明人 |
RAMM JURGEN;VIDRIG BENO;KURAPOV DENIS |
分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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