发明名称 METHOD TO MANUFACTURE PROCESSED SURFACE AND VACUUM SOURCES OF PLASMA
摘要 FIELD: electricity.SUBSTANCE: when processing surfaces of substrates or processed parts with the help of a vacuum plasma discharge between an anode (9) and a cathode (7) a solid substance (19) is formed and deposited on an anode surface (21), and this substance has a higher specific impedance by DC compared to the specific DC impedance of the anode material. At least parts of the anode surface are screened against such deposition by establishment of a screening plasma (25) onto them. There are also versions of vacuum sources of plasma disclosed, which implement the proposed method.EFFECT: expansion of plasma source functional capabilities.36 cl, 16 dwg
申请公布号 RU2479885(C2) 申请公布日期 2013.04.20
申请号 RU20100122060 申请日期 2007.11.01
申请人 EHRLIKON TREJDING AG, TRJUBBAKH 发明人 RAMM JURGEN;VIDRIG BENO;KURAPOV DENIS
分类号 H01J37/32 主分类号 H01J37/32
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