发明名称 CAPACITIVE INSPECTION OF EUV PHOTOMASKS
摘要 <p>Methods and systems for generating an indication of a changing electrostatic field between a sense electrode of a capacitance sensing integrated circuit and a specimen under inspection are presented. The capacitance sensing integrated circuit is an integrated circuit that includes a number of sense electrodes and sense electronics. By fabricating the elements of the capacitance sensing integrated circuit as a single microelectronic chip, the sense electrodes can be miniaturized to sizes that enable inspection of fine line patterns common in modern semiconductor manufacturing. In one embodiment, the sense electrodes are metallic contacts. In another embodiment the sense electrodes are field effect transistors (FETs) with a floating gate. The sense electronics generate an indication of the changing electrostatic field between each sense electrode and a specimen under inspection as the specimen is scanned relative to the capacitance sensing integrated circuit.</p>
申请公布号 WO2013055708(A1) 申请公布日期 2013.04.18
申请号 WO2012US59408 申请日期 2012.10.09
申请人 KLA-TENCOR CORPORATION 发明人 SEZGINER, ABDURRAHMAN
分类号 H01L21/027;G03F1/44 主分类号 H01L21/027
代理机构 代理人
主权项
地址