FLUORINE-CONTAINING SULFONATES, FLUORINE-CONTAINING SULFONATE RESIN, RESIST COMPOSITION, AND PATTERN FORMATION METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a resist resin that incorporates therein a photoacid generating function in order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, and in which a moiety capable of changing its developer solubility by the action of an acid and a moiety having a photoacid generating function are arranged with regularity.

SOLUTION: A fluorine-containing sulfonate resin has a repeating unit of the following general formula (3). In the formula, As each independently denote a hydrogen atom, a fluorine atom or a trifluoromethyl group; n denotes an integer of 1-10; W denotes a divalent linking group; R1 denotes an acid unstable group; and M+ denotes a univalent cation.

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