| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition having an ultrafine pore diameter (for instance, 60 nm or smaller), and capable of forming a hole pattern excellent in circularity with excellent dependence on development time, and to provide a resist film, a pattern forming method, a method for manufacturing an electronic device, and an electronic device using the same. <P>SOLUTION: There is provided an actinic ray sensitive or radiation sensitive resin composition including: (P) a resin having a repeating unit (a) represented by the following general formula (I); and (B) a compound that generates an organic acid by irradiation with an actinic ray or radiation. A content of the compound (B) is 8.0 mass% or more based on the total solid content of the actinic ray sensitive or radiation sensitive resin composition. A resist film, a pattern forming method, a method for manufacturing an electronic device and an electronic device using the same are also provided. In the general formula (I), R<SB POS="POST">0</SB>represents a hydrogen atom or a methyl group. <P>COPYRIGHT: (C)2013,JPO&INPIT |
