| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique advantageous to enhance uniformity of a transferred pattern by reducing the non-uniformity in the amount of gas being condensed by the pressure when a mold is pressed against a resin and dissolved into the resin. <P>SOLUTION: The imprint device for transferring a pattern of mold onto a substrate includes a processing section performing imprint processing for transferring the pattern of mold onto the substrate by hardening a resin while pressing the mold against the resin supplied on the substrate, and then peeling the mold from the resin thus hardened. A gas or a liquid containing a fluorine compound is dissolved into the resin. <P>COPYRIGHT: (C)2013,JPO&INPIT |
