发明名称 |
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To reduce operating power of a nonvolatile semiconductor memory device. <P>SOLUTION: The nonvolatile semiconductor memory device includes a memory cell (MC) in which there are connected in series: an upper electrode (TE) and barrier metals (BM1, BM2) each formed of a TiN layer; a variable resistance element (VR) comprising a metal oxide HfOx layer; a lower electrode (BE) comprising a polysilicon layer and an SiGe layer formed at an interface between the polysilicon layer and the metal oxide HfOx layer; and a bipolar type current rectifying element (Di) formed of an NIP layer. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013069933(A) |
申请公布日期 |
2013.04.18 |
申请号 |
JP20110208208 |
申请日期 |
2011.09.22 |
申请人 |
TOSHIBA CORP |
发明人 |
FUKUMIZU HIROYUKI;NOJIRI YASUHIRO;SEKINE KATSUYUKI |
分类号 |
H01L27/105;G11C13/00;H01L45/00;H01L49/00 |
主分类号 |
H01L27/105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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