发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To reduce operating power of a nonvolatile semiconductor memory device. <P>SOLUTION: The nonvolatile semiconductor memory device includes a memory cell (MC) in which there are connected in series: an upper electrode (TE) and barrier metals (BM1, BM2) each formed of a TiN layer; a variable resistance element (VR) comprising a metal oxide HfOx layer; a lower electrode (BE) comprising a polysilicon layer and an SiGe layer formed at an interface between the polysilicon layer and the metal oxide HfOx layer; and a bipolar type current rectifying element (Di) formed of an NIP layer. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013069933(A) 申请公布日期 2013.04.18
申请号 JP20110208208 申请日期 2011.09.22
申请人 TOSHIBA CORP 发明人 FUKUMIZU HIROYUKI;NOJIRI YASUHIRO;SEKINE KATSUYUKI
分类号 H01L27/105;G11C13/00;H01L45/00;H01L49/00 主分类号 H01L27/105
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