| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new compound useful as an acid-generating agent used for a resist composition, and a production method thereof, to provide a compound useful as a precursor of the compound, to provide an acid-generating agent, to provide a resist composition, and to provide a resist pattern-forming method. <P>SOLUTION: There is provided a compound represented by general formula (b1-1). [Wherein, A is a divalent group forming a 3 to 7-membered ring-structured ring together with an S atom bonded with the A, and the ring may have a substituent; R<SP POS="POST">2</SP>is a group represented by R<SP POS="POST">53</SP>-R<SP POS="POST">54</SP>- (wherein, R<SP POS="POST">53</SP>is a 2-10C alkenyl or aryl; and R<SP POS="POST">54</SP>is a 1-5C linear or branched alkylene); n is 0; and Y<SP POS="POST">1</SP>is a 1-4C alkylene which may be substituted with F]. <P>COPYRIGHT: (C)2013,JPO&INPIT |
