发明名称 COMPOUND, RESIN AND PHOTORESIST COMPOSITION
摘要 A resin comprising a structural unit represented by formula (aa): wherein T1 represents a C3-C34 sultone ring group optionally having a substituent, X1 represents -O- or -N(Rc)-, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents -X2- or -X3-X4-CO-X5-, where X2, X3 and X5 independently each represent a C1-C6 alkanediyl group, X4 represents -O- or -N(Rd)-, and Rd represents a hydrogen atom or a C1-C6 alkyl group, and R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally having a halogen atom.
申请公布号 US2013095424(A1) 申请公布日期 2013.04.18
申请号 US201213648038 申请日期 2012.10.09
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED;SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 ICHIKAWA KOJI;SAKAMOTO HIROMU;FUJITA SHINGO
分类号 C08F28/06;C07D327/04;G03F7/004;G03F7/20 主分类号 C08F28/06
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