A collector (15) for a projection exposure apparatus (1) for micro-lithography comprises a plurality of reflective sections (24) which are embodied and arranged in such a way that they can be impinged upon during the focusing of radiation (14) from a first focus (26) into a second focus (27) with angles (f) of impingement in a predefined angular spectrum.
申请公布号
WO2013053692(A1)
申请公布日期
2013.04.18
申请号
WO2012EP69939
申请日期
2012.10.09
申请人
CARL ZEISS SMT GMBH
发明人
SAENGER, INGO;ZIMMERMANN, JOERG;KRAEHMER, DANIEL;RUOFF, JOHANNES;MEIER, MARTIN;SCHLESENER, FRANK;HENNERKES, CHRISTOPH;SINGER, WOLFGANG
