SILANE COMPOSITION AND CURED FILM THEREOF, AND METHOD FOR FORMING NEGATIVE RESIST PATTERN USING SAME

摘要

[Problem] To provide storage stability that has been heretofore difficult in a condensate obtained by the hydrolysis and condensation of alkoxysilanes using prior methods and, when the condensate is heated and baked into a film, to obtain a hard film with a graphite hardness of at least 5H, and to prevent the generation of cracks in a film with a thickness of at least 3.0 µm. [Solution] An alkoxysilane condensate obtained by the condensation of alkoxysilane A represented by general formula (1): (CH3)Si(OR1)3, alkoxysilane B represented by general formula (2): (Ph)Si(OR1)3, and alkoxysilane C represented by general formula (3): (CH3)2Si(OR1)2 at an A:B:C molar ratio within the range of 30-70:10-50:20-60; and a composition comprising a polyether-modified polydimethylsiloxane.