| 发明名称 |
SPUTTERING TARGET MATERIAL |
| 摘要 |
This invention provides sputtering target materials having high reflectance and excellent heat resistance, which are formed of Ag base alloys formed by adding a specific, minor amount of P to Ag and alloying them.
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| 申请公布号 |
US2013094990(A1) |
申请公布日期 |
2013.04.18 |
| 申请号 |
US201213692256 |
申请日期 |
2012.12.03 |
| 申请人 |
ISHIFUKU METAL INDUSTRY CO., LTD.;ISHIFUKU METAL INDUSTRY CO., LTD. |
发明人 |
HASEGAWA KOICHI;ISHII NOBUO |
| 分类号 |
C23C14/14;C23C14/34;C22C5/06;C22C5/08;C23C14/20;G11B7/24;G11B7/258;G11B7/26 |
主分类号 |
C23C14/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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