发明名称
摘要 <p>In a trench shape measuring apparatus, a substrate having a trench pattern extending in a predetermined trench direction on a measurement area is held by a holding part. A light emission part applies illumination light to the measurement area and reflected light of the illumination light from the measurement area is spectrally dispersed by a diffraction grating of a spectroscope, to acquire a measured spectral reflectance. Since the diffraction grating is arranged so that an angle formed between a direction on the substrate corresponding to a grating direction of the diffraction grating and the trench direction becomes 45 degrees, even if an oscillation direction of the reflected light from the substrate is limited by influence of the trench pattern, it is possible to accurately obtain a spectral reflectance of the measurement area without influence of polarization of the reflected light and obtain a depth of the trench pattern with accuracy.</p>
申请公布号 JP5186129(B2) 申请公布日期 2013.04.17
申请号 JP20070101307 申请日期 2007.04.09
申请人 发明人
分类号 G01B11/02;G01B11/06;H01L21/66 主分类号 G01B11/02
代理机构 代理人
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