发明名称 METHOD FOR PRODUCING GLASS SUBSTRATE WITH ALUMINUM OXIDE-CONTAINING SILICON OXIDE FILM
摘要 <p>To provide a process for producing a glass substrate provided with an aluminum oxide-containing silicon oxide film having a low refractive index and a high light transmittance, with good production efficiency, with which an aluminum oxide-containing silicon oxide film excellent in the moisture resistance can be directly formed on a glass substrate or a glass ribbon at high temperature. (1) A process for producing a glass substrate provided with an aluminum oxide-containing silicon oxide film, which comprises applying a coating liquid containing an organopolysiloxane and an organic aluminum complex to a glass substrate within a temperature range of from 400 to 650°C to form an aluminum oxide-containing silicon oxide film on the glass substrate, and (2) a process for producing a glass substrate comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein a coating liquid containing an organopolysiloxane and an organic aluminum complex is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650°C to form an aluminum oxide-containing silicon oxide film on the glass ribbon.</p>
申请公布号 EP2581351(A1) 申请公布日期 2013.04.17
申请号 EP20110792500 申请日期 2011.06.08
申请人 ASAHI GLASS COMPANY, LIMITED 发明人 KUWAHARA, YUICHI;ABE, KEISUKE
分类号 C03C17/25;C03C17/00 主分类号 C03C17/25
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