发明名称 Projection exposure apparatus and projection exposure method
摘要 Exposure areas are wholly overlapped by moving a gradient refractive index lens array in a direction perpendicular to a scanning direction, or by providing a plurality of gradient refractive index lens arrays, an optical filter having a density distribution of lightness and darkness to compensate light transmission nonuniformity of the gradient refractive index lens array is arranged, or an opening control plate for limitedly using only of a uniform portion is provided. Two or more means may be simultaneously provided among the aforementioned mean. Moreover, any one of a microscopic transmission shutter array, a microscopic reflection shutter array, and a microscopic light emitter array is used instead of a mask, or an illuminating device and the mask.
申请公布号 US8421999(B2) 申请公布日期 2013.04.16
申请号 US20080523917 申请日期 2008.01.17
申请人 HORIUCHI TOSHIYUKI;KOBAYASHI HIROSHI;TOKYO DENKI UNIVERSITY 发明人 HORIUCHI TOSHIYUKI;KOBAYASHI HIROSHI
分类号 G03B27/32;G03B27/44 主分类号 G03B27/32
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