发明名称 |
METHOD OF MANUFACTURING FIELD EFFECT TRANSISTOR HAVING ONE-DIMENSIONAL NANO-STRUCTURE AND THE FIELD EFFECT TRANSISTOR |
摘要 |
<p>PURPOSE: A method for manufacturing a field effect transistor having a one-dimensional nanostructure and the field effect transistor are provided to improve manufacturing efficiency by using a simple process. CONSTITUTION: A silicon nanowire is synthesized on a silicon wafer by performing an electrolyses etching process. The surface of the nanowire is rough. The silicon nanowire is cut down. The silicon nanowire functions as a channel between a source and a drain electrode.</p> |
申请公布号 |
KR101254947(B1) |
申请公布日期 |
2013.04.16 |
申请号 |
KR20110111841 |
申请日期 |
2011.10.31 |
申请人 |
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY |
发明人 |
MYOUNG, JAE MIN;CHOI, JI HYUK |
分类号 |
H01L21/336;H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|