发明名称 METHOD OF MANUFACTURING FIELD EFFECT TRANSISTOR HAVING ONE-DIMENSIONAL NANO-STRUCTURE AND THE FIELD EFFECT TRANSISTOR
摘要 <p>PURPOSE: A method for manufacturing a field effect transistor having a one-dimensional nanostructure and the field effect transistor are provided to improve manufacturing efficiency by using a simple process. CONSTITUTION: A silicon nanowire is synthesized on a silicon wafer by performing an electrolyses etching process. The surface of the nanowire is rough. The silicon nanowire is cut down. The silicon nanowire functions as a channel between a source and a drain electrode.</p>
申请公布号 KR101254947(B1) 申请公布日期 2013.04.16
申请号 KR20110111841 申请日期 2011.10.31
申请人 INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY 发明人 MYOUNG, JAE MIN;CHOI, JI HYUK
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
代理机构 代理人
主权项
地址