| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve problems in which since a principle of conventional foreign matter detection using light scattering is quite different from that of foreign matter detection using a reflection image forming type electron microscope, obtained foreign matter inspection data cannot be directly compared and comprehensive foreign matter management is impossible, and when the same wafer is inspected by individual apparatuses, i.e. an inspection apparatus using scattered light and the reflection image forming type electron microscope, such a risk that a new foreign matter may be attached during the conveyance of the wafer between the two apparatuses cannot be excluded and precise comparison of inspection data is impossible. <P>SOLUTION: A laser beam introduction system and a scattered light detector are arranged around an objective lens of the reflection image forming type electron microscope, and foreign matter detection by scattered light and foreign matter detection by the reflection image forming type electron microscope can be performed by the same apparatus. <P>COPYRIGHT: (C)2013,JPO&INPIT |
