发明名称 Field-effect transistor device having a metal gate stack with an oxygen barrier layer
摘要 A field effect transistor device and method which includes a semiconductor substrate, a dielectric gate layer, preferably a high dielectric constant gate layer, overlaying the semiconductor substrate and an electrically conductive oxygen barrier layer overlaying the gate dielectric layer. In one embodiment, there is a conductive layer between the gate dielectric layer and the oxygen barrier layer. In another embodiment, there is a low resistivity metal layer on the oxygen barrier layer.
申请公布号 US8415677(B2) 申请公布日期 2013.04.09
申请号 US20100690178 申请日期 2010.01.20
申请人 ADUSUMILLI PRANEET;CALLEGARI ALESSANDRO;CHANG JOSEPHINE B.;CHOI CHANGHWAN;FRANK MARTIN MICHAEL;GUILLORN MICHAEL A.;NARAYANAN VIJAY;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 ADUSUMILLI PRANEET;CALLEGARI ALESSANDRO;CHANG JOSEPHINE B.;CHOI CHANGHWAN;FRANK MARTIN MICHAEL;GUILLORN MICHAEL A.;NARAYANAN VIJAY
分类号 H01L29/04 主分类号 H01L29/04
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