发明名称 |
Process for making a slot-type optical waveguide on silicon |
摘要 |
In a process for fabrication of an optical slot waveguide on silicon, a thin single-crystal silicon film is deposited on a substrate covered with an insulating buried layer; a local thermal oxidation is carried out over the entire depth of the thin single-crystal silicon film in order to form an insulating oxidized strip extending along the desired path of the waveguide; an insulating or semi-insulating layer is deposited on the silicon film; two openings having vertical sidewalls are excavated over the entire thickness of this insulating or semi-insulating layer, said openings being separated by a narrow gap constituting an insulating or semi-insulating vertical wall that will be the material of the slot; single-crystal silicon is grown in the openings and right to the edges of the insulating or semi-insulating wall; and then the upper part of the silicon is etched in order to complete the geometry of the waveguide.
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申请公布号 |
US8415185(B2) |
申请公布日期 |
2013.04.09 |
申请号 |
US201113324721 |
申请日期 |
2011.12.13 |
申请人 |
FEDELI JEAN-MARC;DUAN GUANG-HUA;MARRIS-MORINI DELPHINE;RASIGADE GILLES;VIVIEN LAURENT;ZIEBELL MELISSA;COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES;ALCATEL LUCENT;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE;UNIVERSITE PARIS-SUD 11 |
发明人 |
FEDELI JEAN-MARC;DUAN GUANG-HUA;MARRIS-MORINI DELPHINE;RASIGADE GILLES;VIVIEN LAURENT;ZIEBELL MELISSA |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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地址 |
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