CONDUCTIVE FILM AND MANUFACTURING METHOD THEREOF, AND SILVER ALLOY SPUTTERING TARGET FOR FORMING CONDUCTIVE FILM AND MANUFACTURING METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a conductive film which has characteristics of low resistance and high reflectance and small surface roughness and also has high sulfur resistance and chlorine resistance, and a manufacturing method thereof.

SOLUTION: A conductive film contains Cu of 0.1 to 2.5 atom%, Sb of 0.1 to 1.5 atom%, and Ga of 0.5 to 3 atom%, and is constituted of a silver alloy having a component composition composed of the balance being Ag and unavoidable impurities. The conductive film is formed by laminating a transparent conductive film of an organic EL element on the surface thereof, and is suitable as a reflection electrode film for the organic EL element obtained by further laminating an electroluminescent layer containing an organic EL layer thereon.

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