发明名称 Fine particle measuring method, substrate for measurement, and measuring apparatus
摘要 <p>A fine particle measuring method of performing optical measurement of fine particles introduced into a plurality of sample fluidic channels (111) provided at predetermined distances on a substrate (11) by scanning light to the sample fluidic channels (111) is disclosed. The method includes: sequentially irradiating the light to at least two or more reference regions provided together with the sample fluidic channels (111); detecting a change of optical property occurring in the light due to the reference regions; and controlling timing of emission of the light to the sample fluidic channels (111).</p>
申请公布号 EP2056090(A3) 申请公布日期 2013.04.03
申请号 EP20080167937 申请日期 2008.10.30
申请人 SONY CORPORATION 发明人 FURUKI, MOTOHIRO;IMANISHI, SHINGO;SHINODA, MASATAKA;SUZUKI, AKITOSHI;MIYAKE, KAZUSHI
分类号 G01N15/14;G01N21/64 主分类号 G01N15/14
代理机构 代理人
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