| 摘要 |
PURPOSE: An exposure apparatus having the location control function of the projection lens using the negative pressure system is provided to be able to irradiate light uniformly as the drooping central part of the projection lens is moved upward by the negative pressure due to the air circulation to maintain the projection lens horizontally, and to be able to form a film with the even thickness on the surface as light is able to be irradiated to the printed circuit board in near distance. CONSTITUTION: An exposure apparatus comprises a negative pressure case(20); a lighting device(30); and a circulation negative pressure device(40). The negative pressure case has a negative pressure space inside. A transparent panel(211) is prepared on the upper surface portion of the negative pressure case. A projection lens is equipped on the bottom surface of the negative pressure case. The lighting device is prepared on the top of the negative pressure case, and makes light irradiated on a semiconductor substrate(100) arranged below the projection lens through the transparent panel and the projection lens. The circulation negative pressure device circulates the internal air of the negative pressure case, and maintains the horizontal state of the projection lens with the negative pressure of the negative pressure space. |
