发明名称 |
Substrate processing apparatus, positioning method and focus ring installation method |
摘要 |
Positioning accuracy of a component in a substrate processing apparatus can be improved higher than a conventional case without increasing the insertion accuracy of positioning pins into positioning holes. Provided is a substrate processing apparatus including a mounting table 110 including a susceptor 114 having a substrate mounting surface 115 on which a wafer W is mounted and a focus ring mounting surface 116 on which a focus ring 124 is mounted; a plurality of positioning pins 200 made of a material expandable in a diametric direction by heating. Each positioning pin is inserted into a positioning hole (first reference hole) formed in the focus ring mounting surface of the susceptor and into a positioning hole (second reference hole) formed in the focus ring, and expanded in the diametric direction by heating and fitted into the positioning holes, thus allowing a position of the focus ring to be aligned. |
申请公布号 |
US8409995(B2) |
申请公布日期 |
2013.04.02 |
申请号 |
US20100850812 |
申请日期 |
2010.08.05 |
申请人 |
KOBAYASHI YOSHIYUKI;TOKYO ELECTRON LIMITED |
发明人 |
KOBAYASHI YOSHIYUKI |
分类号 |
H01L21/302;B44C1/22;C23F1/00 |
主分类号 |
H01L21/302 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|