发明名称 Substrate processing apparatus, positioning method and focus ring installation method
摘要 Positioning accuracy of a component in a substrate processing apparatus can be improved higher than a conventional case without increasing the insertion accuracy of positioning pins into positioning holes. Provided is a substrate processing apparatus including a mounting table 110 including a susceptor 114 having a substrate mounting surface 115 on which a wafer W is mounted and a focus ring mounting surface 116 on which a focus ring 124 is mounted; a plurality of positioning pins 200 made of a material expandable in a diametric direction by heating. Each positioning pin is inserted into a positioning hole (first reference hole) formed in the focus ring mounting surface of the susceptor and into a positioning hole (second reference hole) formed in the focus ring, and expanded in the diametric direction by heating and fitted into the positioning holes, thus allowing a position of the focus ring to be aligned.
申请公布号 US8409995(B2) 申请公布日期 2013.04.02
申请号 US20100850812 申请日期 2010.08.05
申请人 KOBAYASHI YOSHIYUKI;TOKYO ELECTRON LIMITED 发明人 KOBAYASHI YOSHIYUKI
分类号 H01L21/302;B44C1/22;C23F1/00 主分类号 H01L21/302
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