FILM FORMING APPARATUS AND SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A film forming apparatus and a substrate processing apparatus are provided to prevent various types of process gas from being mixed together by supplying separation gas to each process region including the process gas. CONSTITUTION: A rotation table(2) is installed in a vacuum chamber(1). The rotation table rotates in a substrate mounting region. A process gas supply part supplies different types of process gas to each process region. A separation part has a separation gas nozzle(41). An outlet(62) exhausts the atmosphere in the vacuum chamber. [Reference numerals] (AA,CC) N_2 gas; (BB) Si containing gas; (DD) O_3 gas; (EE) Rotation direction of a rotation table;