| 摘要 |
<p>A POLISHING COMPOSITION CONTAINING A SILICA, AN ACID, A SURFACTANT, AND WATER, WHEREIN (A) THE ACID HAS SOLUBILITY IN WATER AT 25°C OF 1 G OR MORE PER 100 G OF AN AQUEOUS SATURATED SOLUTION; (B) THE SURFACTANT IS A SULFONIC ACID REPRESENTED BY THE FORMULA (1) OR (2), OR A SALT THEREOF; AND (C) THE POLISHING COMPOSITION HAS A PH OF A SPECIFIED RANGE; AND A POLISHING PROCESS OF A SUBSTRATE USING THE POLISHING COMPOSITION ARE PROVIDED. THE POLISHING COMPOSITION IS SUITABLY USED, FOR EXAMPLE IN POLISHING A SUBSTRATE FOR DISK RECORDING MEDIA SUCH AS MAGNETIC DISKS, OPTICAL DISKS AND OPTO-MAGNETIC DISKS.</p> |
