| 发明名称 |
PLASMA CLEANING APPARATUS |
| 摘要 |
PURPOSE: A plasma cleaning apparatus is provided to uniformly clean the surface of a cleaning object by using a long through hole. CONSTITUTION: A first electrode(10) and a second electrode(20) is arranged in a housing(30) to generate plasma. A through hole(21) is formed in the second electrode. The through hole includes perforation holes(211) and slit holes(212). A cleaning object(40) is positioned in the lower part of the second electrode.
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| 申请公布号 |
KR20130031138(A) |
申请公布日期 |
2013.03.28 |
| 申请号 |
KR20110094887 |
申请日期 |
2011.09.20 |
| 申请人 |
GENIATECH INC. |
发明人 |
SHIM, YUN KEUN;KIM, DUK JAE |
| 分类号 |
H01L21/302;H01L21/3065 |
主分类号 |
H01L21/302 |
| 代理机构 |
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