| 摘要 |
<p>A wafer carrier (32) used in wafer treatments such as chemical vapor deposition has pockets (40,240) for holding the wafers and support surfaces for supporting the wafers above the floors of the pockets. The carrier is provided with locks (50,250) for restraining wafers against upward movement away from the support surfaces (56, 254). Constraining the wafers against upward movement limits the effect of wafer distortion on the spacing between the wafer and the floor surfaces, and thus limits the effects of wafer distortion on heat transfer. The carrier may include a main portion (38) and minor portions (44) having higher thermal conductivity than the main portion, the minor portions being disposed below the pockets.</p> |
