发明名称 |
ARRANGEMENT FOR USE IN A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A REFLECTIVE OPTICAL ELEMENT |
摘要 |
An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24). |
申请公布号 |
US2013077064(A1) |
申请公布日期 |
2013.03.28 |
申请号 |
US201213561502 |
申请日期 |
2012.07.30 |
申请人 |
EHM DIRK HEINRICH;KAMPEN MAARTEN VAN;SCHMIDT STEFAN-WOLFGANG;BANINE VADIM YEVGENYEVICH;LOOPSTRA ERIK |
发明人 |
EHM DIRK HEINRICH;KAMPEN MAARTEN VAN;SCHMIDT STEFAN-WOLFGANG;BANINE VADIM YEVGENYEVICH;LOOPSTRA ERIK |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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