发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 An embodiment of a compound semiconductor device includes: a substrate; an electron channel layer and an electron supply layer formed over the substrate; a gate electrode, a source electrode and a drain electrode formed on or above the electron supply layer; and a p-type semiconductor layer formed between the electron supply layer and the gate electrode. The p-type semiconductor layer contains, as a p-type impurity, an element same as that being contained in at least either of the electron channel layer and the electron supply layer.
申请公布号 US2013076443(A1) 申请公布日期 2013.03.28
申请号 US201213546160 申请日期 2012.07.11
申请人 YAMADA ATSUSHI;FUJITSU LIMITED 发明人 YAMADA ATSUSHI
分类号 H03F3/16;H01L21/338;H01L29/778 主分类号 H03F3/16
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