| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive siloxane composition excellent in transparency after heat curing and capable of giving a cured film which suppresses cracking after impregnation with an alkali solvent and excels in adhesiveness to a substrate. <P>SOLUTION: The photosensitive siloxane composition includes (a) a polysiloxane, (b) a quinonediazide compound, (c) a solvent and (d) an adhesion accelerator made of a bisimide compound or an acrylic polymer compound having an imide group in a side chain. <P>COPYRIGHT: (C)2008,JPO&INPIT |
