发明名称 STACKED PIEZOELECTRIC THIN FILM STRUCTURE FOR EVALUATING RESIDUAL STRAIN
摘要 <p>PURPOSE: A stacked piezoelectric thin film structure for measuring residual stress is provided to efficiently measure residual strain according to the residual stress of the stacked piezoelectric thin film. CONSTITUTION: A stacked piezoelectric thin film structure for measuring residual stress comprises a mirror reflecting face(402) and one or more beams(403). The mirror reflecting face is formed at the center of a substrate. The beams are formed from the lateral sides of the mirror reflecting face to the edge of the substrate and have predetermined width and length.</p>
申请公布号 KR20130029861(A) 申请公布日期 2013.03.26
申请号 KR20110093220 申请日期 2011.09.16
申请人 TONGMYONG UNIVERSITY INDUSTRIAL-ACADEMIC COOPERATION FOUNDATION 发明人 PARK, JUN HYUB;KIM, HEE YEOUN;NAM, HYUN SUK;OH, YOUNG RYUN
分类号 G01L1/16;G01L1/26 主分类号 G01L1/16
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