发明名称 Integrated circuit system with via and method of manufacture thereof
摘要 A method of manufacture of an integrated circuit system includes: forming an etch stop layer over a bulk substrate; forming a buffer layer on the etch stop layer; forming a hard mask on the buffer layer; forming a through silicon via through the etch stop layer with the hard mask detected and the buffer layer removed with a low down force; and forming a passivation layer on the through silicon via and the etch stop layer.
申请公布号 US8405222(B2) 申请公布日期 2013.03.26
申请号 US20100825266 申请日期 2010.06.28
申请人 YU HONG;LIU HUANG;ZHAO FENG;ZHOU MEISHENG;HSIA LIANG-CHOO;GLOBALFOUNDRIES SINGAPORE PTE. LTD. 发明人 YU HONG;LIU HUANG;ZHAO FENG;ZHOU MEISHENG;HSIA LIANG-CHOO
分类号 H01L21/00 主分类号 H01L21/00
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