发明名称 |
Tunable gas flow equalizer |
摘要 |
A tunable gas flow equalizer is described. In an embodiment, the tunable flow equalizer includes a gas flow equalizer plate having primary opening and a secondary opening. The primary opening may surround a substrate support, and the secondary opening may be configured with a tuner. In an embodiment, the substrate support may be vertically adjustable with respect to the gas flow equalizer plate. The flow uniformity may be fine tuned by adjusting a tuner configured with a secondary opening in the gas flow equalizer plate and/or by adjusting the height of a vertically positionable substrate support plate having an inwardly tapered skirt 528 with respect to the gas flow equalizer plate 520. |
申请公布号 |
US8398814(B2) |
申请公布日期 |
2013.03.19 |
申请号 |
US20090499742 |
申请日期 |
2009.07.08 |
申请人 |
BALAKRISHNA AJIT;KENNEY JASON ANDREW;NGUYEN ANDREW;COLLINS KENNETH;APPLIED MATERIALS, INC. |
发明人 |
BALAKRISHNA AJIT;KENNEY JASON ANDREW;NGUYEN ANDREW;COLLINS KENNETH |
分类号 |
H01L21/3065 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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