发明名称 Nano-wire field effect transistor, method for manufacturing the transistor, and integrated circuit including the transistor
摘要 A manufacturing method of the nano-wire field effect transistor, comprising steps of preparing an SOI substrate having a (100) surface orientation; processing a silicon crystal layer comprising the SOI substrate into a standing plate-shaped member having a rectangular cross-section; processing the silicon crystal layer by orientation dependent wet etching and thermal oxidation into a shape where two triangular columnar members are arranged one above the other with a spacing from each other so as to face along the ridge lines of the triangular columnar members; and processing the two triangular columnar members into a circular columnar member configuring a nano-wire by hydrogen annealing or thermal oxidation.
申请公布号 US8399330(B2) 申请公布日期 2013.03.19
申请号 US201213477239 申请日期 2012.05.22
申请人 LIU YONGXUN;MATSUKAWA TAKASHI;ENDO KAZUHIKO;OUCHI SHINICHI;SAKAMOTO KUNIHIRO;MASAHARA MEISHOKU;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY 发明人 LIU YONGXUN;MATSUKAWA TAKASHI;ENDO KAZUHIKO;OUCHI SHINICHI;SAKAMOTO KUNIHIRO;MASAHARA MEISHOKU
分类号 H01L21/331 主分类号 H01L21/331
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